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US Patent Issued to Sumitomo Chemical on April 21 for "Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern" (Japanese Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,930, issued on April 21, was assigned to Sumitomo Chemical Co. Ltd. (Tokyo). "Carboxylate, carboxylic acid generator, resist composition a... Read More


US Patent Issued to FUJIFILM on April 21 for "Photosensitive transfer material, light shielding material, LED array, and electronic apparatus" (Japanese Inventor)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,931, issued on April 21, was assigned to FUJIFILM Corp. (Tokyo). "Photosensitive transfer material, light shielding material, LED array, a... Read More


US Patent Issued to INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE on April 21 for "Photosensitive composition and film prepared from the same" (Taiwanese Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,932, issued on April 21, was assigned to INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Hsinchu, Taiwan). "Photosensitive composition and film ... Read More


US Patent Issued to DUPONT ELECTRONICS on April 21 for "Polymer compositions having photoacid generators and photoresists" (Ohio, Texas Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,933, issued on April 21, was assigned to DUPONT ELECTRONICS INC. (Wilmington, Del.). "Polymer compositions having photoacid generators and... Read More


US Patent Issued to Huawei Technologies on April 21 for "Patterning material and patterned film" (Chinese Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,934, issued on April 21, was assigned to Huawei Technologies Co. LTD. (Shenzhen, China). "Patterning material and patterned film" was inve... Read More


US Patent Issued to CHANGXIN MEMORY TECHNOLOGIES on April 21 for "Method of forming photoresist pattern, and photoresist structure" (Chinese Inventor)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,935, issued on April 21, was assigned to CHANGXIN MEMORY TECHNOLOGIES INC. (Hefei City, China). "Method of forming photoresist pattern, an... Read More


US Patent Issued to NISSAN CHEMICAL on April 21 for "Film-forming composition having a multiple bond" (Japanese Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,936, issued on April 21, was assigned to NISSAN CHEMICAL Corp. (Tokyo). "Film-forming composition having a multiple bond" was invented by ... Read More


US Patent Issued to Taiwan Semiconductor Manufacturing on April 21 for "Photoresist top coating material for etching rate control" (Taiwanese Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,937, issued on April 21, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Photoresist top coating material ... Read More


US Patent Issued to ASML NETHERLANDS on April 21 for "Imaging system" (Dutch Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,938, issued on April 21, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands). "Imaging system" was invented by Albertus Hartger... Read More


US Patent Issued to XSYS PREPRESS on April 21 for "Method and system to determine an exposure time and/or intensity to be used for obtaining a desired feature of a relief structure" (Belgian, German Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,939, issued on April 21, was assigned to XSYS PREPRESS NV (Ypres, Belgium). "Method and system to determine an exposure time and/or intens... Read More